• 专利标题:   Manufacturing graphene electrode, comprises e.g. forming carbon source on substrate, forming photoresist layer on carbon source, exposing photoresist layer with mask, developing photoresist layer after exposure and forming metal layer.
  • 专利号:   US2020201100-A1
  • 发明人:   WANG H
  • 专利权人:   TCL CHINA STAR OPTOELECTRONICS TECHNOLOG
  • 国际专利分类:   C01B032/182, C01B032/184, C01B032/186, G02F001/1343
  • 专利详细信息:   US2020201100-A1 25 Jun 2020 G02F-001/1343 202057 Pages: 12 English
  • 申请详细信息:   US2020201100-A1 US804300 28 Feb 2020
  • 优先权号:   US535699, US804300

▎ 摘  要

NOVELTY - Manufacturing a graphene electrode, comprises: e.g. providing a substrate, and forming a carbon source on the substrate; forming a photoresist layer on the carbon source; providing a mask, and exposing the photoresist layer with the mask; developing the photoresist layer after exposure to form the photoresist layer which is patterned on the carbon source; forming a metal layer on the substrate, which is covered with the carbon source and the photoresist layer which is patterned in order, and a portion of the metal layer covering on the photoresist layer which is patterned, and the other portion directly covering on the carbon source not covered by the photoresist layer which is patterned; and stripping the photoresist layer which is patterned and the metal layer covering on the photoresist layer which is patterned from the carbon source, and the metal layer directly covering on the carbon source forming the metal layer which is patterned. USE - The method is useful for manufacturing a graphene electrode. ADVANTAGE - The method is simple and reduces the difficulty of patterning the graphene electrode to decrease the processing cost in advance. DETAILED DESCRIPTION - Manufacturing a graphene electrode, comprises: providing a substrate, and forming a carbon source on the substrate; forming a photoresist layer on the carbon source; providing a mask, and exposing the photoresist layer with the mask; developing the photoresist layer after exposure to form the photoresist layer which is patterned on the carbon source; forming a metal layer on the substrate, which is covered with the carbon source and the photoresist layer which is patterned in order, and a portion of the metal layer covering on the photoresist layer which is patterned, and the other portion directly covering on the carbon source not covered by the photoresist layer which is patterned; stripping the photoresist layer which is patterned and the metal layer covering on the photoresist layer which is patterned from the carbon source, and the metal layer directly covering on the carbon source forming the metal layer which is patterned; heating the metal layer which is patterned under an inactive gas protection to catalyze the carbon source in direct contact with the metal layer which is patterned to form the graphene which is patterned on the substrate; removing the metal layer which is patterned, and retaining the graphene which is patterned on the substrate to form the graphene electrode which is patterned.