• 专利标题:   Preparing suspended graphene structure useful for preparing microelectromechanical system comprises processing diaphragm to perform patterning to obtain the patterned area and the remaining areas, and removing remaining regions.
  • 专利号:   CN111320164-A
  • 发明人:   SONG X, ZENG W, WANG Y
  • 专利权人:   UNIV SOUTHERN SCI TECHNOLOGY
  • 国际专利分类:   C01B032/194
  • 专利详细信息:   CN111320164-A 23 Jun 2020 C01B-032/194 202056 Pages: 9 Chinese
  • 申请详细信息:   CN111320164-A CN10127240 28 Feb 2020
  • 优先权号:   CN10127240

▎ 摘  要

NOVELTY - Preparing suspended graphene structure comprises (1) processing diaphragm to perform patterning to obtain the patterned area and the remaining areas, where the membrane to be processed includes a sacrificial layer, a graphene sheet layer and an electron beam glue layer arranged in sequence, and the membrane to be processed includes a sacrificial layer, a graphene sheet layer and an electron beam glue layer arranged in sequence, and (2) removing remaining regions and the sacrificial layer in sequence, and transferring the patterned regions to the substrate to obtain the suspended graphene structure. USE - The suspended graphene structure is useful for preparing microelectromechanical systems (claimed). ADVANTAGE - The method: does not involve corrosive liquid; is simple; realizes easy transfer and assemble of graphene; and achieves preparation of suspended structures of graphene materials with different shapes and different sizes. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for suspended graphene structure.