▎ 摘　　要

NOVELTY - Manufacture of non-catalytic low-temperature graphene-grown substrate involves forming a substrate free of catalyst layer at the surface, supplying a gas containing carbon at 500 degrees C or less, performing inductively-coupled plasma chemical vapor deposition, supplying etching gas, adsorbing hydrocarbon radicals, diffusing on the surface of nucleus by Van der Waals force, growing hetero-epitaxially, performing low pressure chemical vapor deposition constantly and growing graphene. USE - Manufacture of non-catalytic low-temperature graphene-grown substrate for electronic component.