• 专利标题:   Treating surface of titanium substrate involves forming a nitrided surface by supplying nitrogen gas to a substrate including titanium or a titanium alloy, forming porous layer by anodizing on substrate on which nitrided surface is formed.
  • 专利号:   KR2021071925-A, KR2411102-B1
  • 发明人:   LIM H P, SANGWON P, JI M K, SEUNG K, CHO H S, PARK C, KIM H
  • 专利权人:   UNIV CHONNAM NAT IND FOUND
  • 国际专利分类:   A61C013/00, A61C008/00, C23C028/04, C23C008/24, C25D011/26
  • 专利详细信息:   KR2021071925-A 16 Jun 2021 C25D-011/26 202158 Pages: 16
  • 申请详细信息:   KR2021071925-A KR075148 10 Jun 2021
  • 优先权号:   KR081944, KR075148

▎ 摘  要

NOVELTY - Treating surface of titanium substrate involves forming a nitrided surface by supplying nitrogen (N2) gas to a substrate including titanium or a titanium alloy, forming a porous layer by anodizing on the substrate on which the nitrided surface in an electrolyte solution containing at least one of phosphoric acid (H3PO4) and hydrofluoric acid (HF). USE - Method for treating surface of titanium substrate. ADVANTAGE - The method has the effect of advancing an effective and stable healing process, inhibits the adhesion of harmful bacteria present in the oral cavity, increases the adhesion and proliferation of periodontal tissues such as gingival fibroblasts or osteoblasts, periodontal surgical treatment when the titanium substrate treated in this way is used as a dental implant.