▎ 摘　　要

NOVELTY - A method of manufacturing EUV photomask inorganic protection film component comprises steps of: obtaining a copper foil, the edge of the copper foil clamped by a large frame and a small frame; placing the copper foil in a quartz glass tube to be heated by methane so that a graphene layer is formed on the surface of the copper foil; clamping the large and small frames out and depositing a first silicon nitride layer on the surface of the graphene layer; forming a perfluoropolymer layer on the surface of the first silicon nitride layer; adhering a temporary frame on the surface of the perfluoropolymer layer through an organic glue; after dissolving and eliminating the copper foil by using a ferric chloride lotion, depositing a second silicon nitride layer on another surface of the graphene layer; after adhering a primary frame on another surface of the second silicon nitride layer through an inorganic glue, removing the temporary frame, and removing the perfluoropolymer layer through a perfluorinated solvent, thereby forming an EUV photomask inorganic protection film component.