▎ 摘　　要

NOVELTY - A self-cleaning light curing antifogging coating comprises 3-8 pts. wt. modified graphene nanoparticles, 20-80 pts. wt. hydrophilic photosensitive resin, 5-20 pts. wt. photoinitiator, 15-40 pts. wt. diluent and 1-3 pts. wt. curing accelerator. USE - Self-cleaning light curing antifogging coating. ADVANTAGE - The coating is suitable for all kinds of base material, has persistent fog-proof, good self-cleaning properties, hydrophilic, dispersivity and compatibility with hydrophilic photosensitive resin, inhibits bacterial growth, forms crosslinked network, and improves strength, abrasion resistance, adhesion, hardness, water resistance and mechanical resistance. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for preparation of self-cleaning light curing antifogging coating comprising adding 40-80 pts. wt. allyl glycidyl ether, 5-12 pts. wt. graphite, 20-50 pts. wt. diluent and 1-3 pts. wt. phenol polymerization inhibitor into reaction container, ultrasonically dispersing for 30 minutes, stirring at 80-130 degrees C for 18 hours to obtain allyl grafting modified graphene, adding 15-30 pts. wt. allyl grafting modified graphene, 50-90 pts. wt. hydrophilic monomer and 35-60 pts. wt. diluent into reaction container, stirring to 50-80 degrees C for 24 hours to obtain modified graphene nanoparticle, taking 20-60 pts. wt. acrylate monomer, 10-40 pts. wt. dimethylaminoethyl methacrylate and 10-50 pts. wt. nitrogen atom-containing vinyl monomer, slowly dripping 20-60 pts. wt. second diluent at 90 degrees C, adding 0.5-5 pts. wt. second initiator for 6-8 hours, heat preserving heat for 2-3 hours to obtain hydrophilic photosensitive resin, and uniformly mixing materials.