• 专利标题:   Synthesizing halogenated bismuth oxide/graphene hydrogel comprises e.g. preparing graphene hydrogel, immersing graphene hydrogel with cetyltrimethylammonium chloride aqueous solution in flask, dissolving bismuth(III) nitrate pentahydrate.
  • 专利号:   CN107051340-A
  • 发明人:   WANG K, DU X, JIANG D
  • 专利权人:   UNIV JIANGSU
  • 国际专利分类:   B01J013/00, B01J027/24
  • 专利详细信息:   CN107051340-A 18 Aug 2017 B01J-013/00 201774 Pages: 8 Chinese
  • 申请详细信息:   CN107051340-A CN10085516 17 Feb 2017
  • 优先权号:   CN10085516

▎ 摘  要

NOVELTY - Synthesizing halogenated bismuth oxide/graphene hydrogel comprises e.g. preparing graphene hydrogel, immersing the graphene hydrogel with cetyltrimethylammonium chloride or hexadecyl trimethyl ammonium bromide aqueous solution in a flask, dissolving bismuth(III) nitrate pentahydrate in deionized water, adding concentrated nitric acid solution for adjusting pH to 2-4, obtaining bismuth(III) nitrate pentahydrate solution, adding bismuth(III) nitrate pentahydrate solution slowly in graphene hydrogel and cetyltrimethylammonium chloride or hexadecyl trimethyl ammonium bromide mixed solution. USE - The method is useful for synthesizing halogenated bismuth oxide/graphene hydrogel (claimed). The hydrogel is useful in field of photocatalysis, photoelectrochemistry and biosensor. ADVANTAGE - The method: is simple; uses economical raw materials; and has mild conditions. The gel has high photo-generated electron-hole separation efficiency, good conductivity, and rich porous structure. DETAILED DESCRIPTION - Synthesizing halogenated bismuth oxide/graphene hydrogel comprises (i) preparing graphene hydrogel, (ii) immersing the graphene hydrogel with cetyltrimethylammonium chloride or hexadecyl trimethyl ammonium bromide aqueous solution in a flask, (iii) dissolving bismuth(III) nitrate pentahydrate in deionized water, adding concentrated nitric acid solution for adjusting the pH value to 2-4, obtaining bismuth(III) nitrate pentahydrate solution, and (iv) adding bismuth(III) nitrate pentahydrate solution slowly in graphene hydrogel and cetyltrimethylammonium chloride or hexadecyl trimethyl ammonium bromide mixed solution, boiling in oil bath at 60-120 degrees C for 3-5 hours, washing resulting product with ethanol and deionized water for 3-5 times, and freeze-drying to obtain halogenated bismuth oxide/graphene hydrogel, namely BiOX/graphene hydrogel, where X is Cl or Br.