• 专利标题:   Preparing silicon nitrogen co-doped graphene quantum dot in antibacterial aspect, involves preparing by carbon powder and ethylenediamine, where carbon powder contains silicon dioxide.
  • 专利号:   CN113277499-A, CN113277499-B
  • 发明人:   WU Y, GAO J, ZHAN X, HUANG X, LI B
  • 专利权人:   EXCELLENT COLOR TECHNOLOGY HUBEI CO LTD, UNIV HUBEI NORMAL
  • 国际专利分类:   A01N059/00, A01P001/00, C01B032/184, C01B032/194
  • 专利详细信息:   CN113277499-A 20 Aug 2021 C01B-032/184 202187 Pages: 21 Chinese
  • 申请详细信息:   CN113277499-A CN10497881 07 May 2021
  • 优先权号:   CN10497881

▎ 摘  要

NOVELTY - Preparing silicon nitrogen co-doped graphene quantum dot involves preparing by carbon powder and ethylenediamine, where the carbon powder contains silicon dioxide. USE - Method for preparing silicon nitrogen co-doped graphene quantum dot in antibacterial aspect, where the minimum sterilizing concentration in the application of anti-colonbacillus is 2.16 x 10-4 g/mL (all claimed). ADVANTAGE - The method uses the waste carbon powder generated in the printer/copier production process, reduces the waste processing cost, but also reduces the production cost of thegraphene quantum dot; Using the method to produce1 ton graphene quantum dot and the productionmethod recorded in the existing document, does not need to use citric acid, the cost can be reduced by 3 times.