▎ 摘　　要

NOVELTY - System comprises: a chamber to receive the layer of graphene (54) on a support (52); a first container (102) in operative relationship with the chamber (72), where the first container includes an initiator, and port; and a second container (106) in operative relationship with the chamber, where the second container includes an activator. The chamber is configured to operate with the first container to apply the initiator through the hole to the support to functionalize the support and to produce an initiator layer on the support. USE - The system is useful to repair a layer of graphene including a hole (claimed). ADVANTAGE - The system produces a polymer plug in the hole of graphene layer, that is robust to handle a dry or wet etching process. DETAILED DESCRIPTION - System comprises: a chamber to receive the layer of graphene (54) on a support (52); a first container (102) in operative relationship with the chamber (72), where the first container includes an initiator, and port; and a second container (106) in operative relationship with the chamber, where the second container includes an activator. The chamber is configured to operate with the first container to apply the initiator through the hole to the support to functionalize the support and to produce an initiator layer on the support, to operate with the second container to apply the activator through the hole to the initiator layer to activate the initiator layer, and to operate with the second container to grow a polymer from the initiator layer by use of the activator to produce a polymer plug in the hole. An INDEPENDENT CLAIM is also included for a structure comprising: a layer of graphene on the support, the layer of graphene including pores and at least one hole region; and a polymer plug grown from the support and in the hole region of the layer of graphene. DESCRIPTION OF DRAWING(S) - The figure illustrates the system. Support (52) Graphene (54) Chamber (72) First container (102) Second container (106)