• 专利标题:   Pellicle used for extreme ultraviolet lithography, comprises central layer formed on pellicle frame, and surface layer formed by heat treatment to include any one or more elements of carbon, nitrogen and oxygen on outside of central layer.
  • 专利号:   KR2022017135-A
  • 发明人:   SHIN C, LEE C, HONG J H, YUN J W, PARK C G, LEESEUNGJO, KIM J, LEE H
  • 专利权人:   S S TECH CO LTD
  • 国际专利分类:   G03F001/22, G03F001/62
  • 专利详细信息:   KR2022017135-A 11 Feb 2022 G03F-001/62 202218 Pages: 15
  • 申请详细信息:   KR2022017135-A KR097256 04 Aug 2020
  • 优先权号:   KR097256

▎ 摘  要

NOVELTY - A pellicle comprises a central layer formed on a pellicle frame, and a surface layer formed by heat treatment to include any one or more elements of carbon, nitrogen, and oxygen on the outside of the central layer. USE - Pellicle used for extreme UV lithography. ADVANTAGE - The pellicle has excellent heat dissipation performance, stability in extreme UV lithography environment, and excellent mechanical strength.