• 专利标题:   Silicon carbide ohmic electrode structure, has silicon carbide substrate made of silicon carbide single crystal or silicon carbide epitaxial layer, and graphene layer forming single layer or multi-layer structure.
  • 专利号:   CN103117298-A
  • 发明人:   CHEN X, GUO L, LIU C
  • 专利权人:   CHINESE ACAD SCI PHYSICS INST
  • 国际专利分类:   H01L021/28, H01L029/45
  • 专利详细信息:   CN103117298-A 22 May 2013 H01L-029/45 201367 Pages: 9 Chinese
  • 申请详细信息:   CN103117298-A CN10366469 17 Nov 2011
  • 优先权号:   CN10366469

▎ 摘  要

NOVELTY - The structure has a silicon carbide substrate made of silicon carbide single crystal or silicon carbide epitaxial layer, where form of the silicon carbide single crystal is 4-hydrogen-silicon carbide (4H-SiC), 6-hydrogen-silicon carbide (6H-SiC), 3-carbon-silicon carbide (3C-SiC) or rhombohedral-silicon carbide (15R-SiC). A graphene layer forms a single layer or multi-layer structure. A metal forms a single metal layer or two metal composite metal layer, where the metal is Titanium (Ti), Nickel (Ni), Aluminum (Al), Gold (Au), Platinum (Pt), Tantalum (Ta), Tungsten (W), or Chromium (Cr). USE - Silicon carbide ohmic electrode structure. ADVANTAGE - The structure reduces contact resistance and improves stability. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a silicon carbide ohmic electrode preparation method. DESCRIPTION OF DRAWING(S) - The drawing shows a sectional view of a silicon carbide ohmic electrode structure.