▎ 摘　　要

NOVELTY - Physical vapor deposition of boron atoms from solid boron source is carried out on a substrate to form hexagonal phase boron nitride film. The deposition rate is 0.01-20 nm/minute. The substrate temperature is controlled at 20-1600 degrees C and temperature is reduced to room temperature at a rate of 10-400 degrees C/minute. USE - Hexagonal phase boron nitride film used for improving performance of graphene optoelectronic device. ADVANTAGE - The hexagonal phase boron nitride film having excellent flatness and insulating property is manufactured with high safety by a simple and easy process.