• 专利标题:   Complex texturing additive comprises graphene, graphene oxide, surfactant, metal ion and solvent.
  • 专利号:   CN110295396-A
  • 发明人:   WANG J, JU Q, WANG W, MA Y
  • 专利权人:   SHANGHAI INST CERAMICS CHINESE ACAD SCI
  • 国际专利分类:   C30B029/06, C30B033/10
  • 专利详细信息:   CN110295396-A 01 Oct 2019 C30B-033/10 201982 Pages: 11 Chinese
  • 申请详细信息:   CN110295396-A CN10640886 16 Jul 2019
  • 优先权号:   CN10640886

▎ 摘  要

NOVELTY - Complex texturing additive comprises graphene, graphene oxide, surfactant, metal ion and solvent, where the concentration of graphene or graphene oxide in the complex texturing additive is 0.1-50 mg/l, the metal ion is silver ions, gold ions, palladium ions, copper ions, nickel ion, manganese ion, barium ion, platinum ion or barium ion and the concentration of the metal ions is 0.00000001-0.1 mol/l. USE - The complex texturing additive is useful in the acidic corrosive liquid (claimed). DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for: (1) the acidic corrosive liquid, comprising complex texturing additive, mixed solution containing nitric acid and hydrofluoric acid, where the volume ratio of hydrofluoric acid, concentrated nitric acid and water in the mixed solution containing nitric acid and hydrofluoric acid is (1-10):(1-30):1-10, the concentrated nitric acid is a nitric acid having a mass fraction of 69-72 wt.% and the volume ratio of the complex texturing additive to the mixed solution containing nitric acid and hydrofluoric acid is (2-5):500; (2) etching the polycrystalline silicon wafer, comprising placing the polycrystalline silicon wafer in the acidic corrosive liquid, carrying out etching at 5-15 degrees C for 30-100 seconds, washing and drying; and (3) the polycrystalline silicon wafer having a surface having a pile surface is obtained by the above mention method.