▎ 摘　　要

NOVELTY - Preparing an ultra-thin functional thin film material without a substrate, comprises evaporating, sputtering, and depositing on the substrate material by means of chemical or physical etching; separating the upper film, and transferring the film material to a substrate with a middle hole in a liquid environment, and then a functional film material without a substrate is formed in the mesoporous area of the substrate. USE - The ultra-thin functional thin film material is useful for preparation of solid density plasma targets in molecular screening, ion filtration, and strong field physics. ADVANTAGE - The method solves the problem that the functional film material is difficult to exist stably away from the substrate. DETAILED DESCRIPTION - INDEPENDNET CLAIMS are also included for: (1) substrate-free ultra-thin functional film material; (2) substrate-free h-BN functional film material; and (3) multilayer graphene functional film material without a substrate for preparing an ultra-thin functional film material without a substrate.