▎ 摘　　要

NOVELTY - A laminate structure (a) comprising a metal thin film and carbon-dissolved silicon thin film is formed and then thermal-treated, to form laminate structure (b) comprising a graphene layer (I), a metal silicide thin film, and graphene layer (II) on a substrate. Then, metal silicide thin film and graphene layer (II) are removed, to from graphene structure. USE - Manufacture of graphene. ADVANTAGE - The method efficiently and economically provides.