• 专利标题:   X-ray analysis apparatus, has X-ray irradiation equipment irradiating X ray inside of chamber with graphene sample, and sample holder catching edge portion inside chamber, where graphene sample is laid in X-ray exposure angle.
  • 专利号:   KR1535454-B1
  • 发明人:   SEUNG H H
  • 专利权人:   KOREA INST CERAMIC ENG TECHNOLOGY
  • 国际专利分类:   G01N023/20, G01N023/207, G01N003/08
  • 专利详细信息:   KR1535454-B1 13 Jul 2015 G01N-023/20 201552 Pages: 28
  • 申请详细信息:   KR1535454-B1 KR193311 30 Dec 2014
  • 优先权号:   KR193311

▎ 摘  要

NOVELTY - The apparatus has an X-ray irradiation equipment irradiating X-ray to inner side of a chamber with a graphene sample. A sample holder catches an edge portion inside the chamber, where the graphene sample is laid in an arrangement of an X-ray exposure angle. The graphene sample with the pole microscopic thickness is detected using an X-ray analysis equipment, in which extension of the graphene sample is formed to extend the graphene sample to catch to one direction by setting up pole microscopic thickness for irradiated X-ray in a drawn range. USE - X-ray analysis apparatus. ADVANTAGE - The apparatus reduces size of a limitation thin film to 3mm for X-ray analysis, so that industrial application of the graphene is spotlighted as next generation material with material property, thus improving reliability and product competitiveness of a finished product. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of an X-ray analysis apparatus. '(Drawing includes non-English language text)'