• 专利标题:   Method for constructing correlation modeling system between chemical vapor deposition conditions and graphene specification results, involves training machine learning model based on regression or classification algorithm.
  • 专利号:   KR2022109598-A
  • 发明人:   HWANG S W, HWANG K Y, SHIN N, KIM T
  • 专利权人:   UNIV INHA RES BUSINESS FOUND
  • 国际专利分类:   G06N020/00, G06N003/08
  • 专利详细信息:   KR2022109598-A 05 Aug 2022 G06N-020/00 202268 Pages: 33
  • 申请详细信息:   KR2022109598-A KR012801 29 Jan 2021
  • 优先权号:   KR012801

▎ 摘  要

NOVELTY - The method involves analyzing and generating data. A machine learning model is trained based on a regression or classification algorithm to build a learning model. Correlation between chemical vapor deposition (CVD) conditions and graphene specification results is modeled. A neural network model is provided with a region based convolution neural networks (R-CNN). The CVD conditions are included with temperature, annealing time, hydrogen supply and growth time. The graphene specification result data is included with size, coverage, domain density, aspect ratio and deviation of graphene. USE - Method for constructing a correlation modeling system between CVD conditions and graphene specification results based on machine learning. ADVANTAGE - The excessive time and cost for individual CVD experiments and analysis of the specifications of synthesized graphene are saved. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for an apparatus for constructing a correlation modeling system between CVD conditions and graphene specification results based on machine learning. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic representation of the CVD process conditions and a CVD system.