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  • 专利标题:   Antimicrobial mask useful in e.g. antibacterial band, antibacterial plate and antibacterial tiles to inhibit growth of bacteria, preferably Escherichia coli, comprises combination graphene-based antimicrobial composition and photocatalyst.
  • 专利号:   KR2017025622-A
  • 发明人:   SOOYEON J
  • 专利权人:   SOOYEON J
  • 国际专利分类:   A01N059/00, A61L015/42, A61L002/08, A61L002/16, A62B018/02, D06M011/74, D21H027/20
  • 专利详细信息:   KR2017025622-A 08 Mar 2017 A01N-059/00 201725 Pages: 4
  • 申请详细信息:   KR2017025622-A KR122342 31 Aug 2015
  • 优先权号:   KR122342

▎ 摘　　要

NOVELTY - Antimicrobial mask comprises combination graphene-based antimicrobial composition and photocatalyst. USE - The mask is useful in antibacterial bandage, antibacterial band, antibacterial medical article, antibacterial fruit wrapping paper, antibacterial flower wrapping paper, antibacterial wallpaper, antibacterial plate and antibacterial tiles for inhibiting growth of bacteria, preferably Escherichia coli (claimed). ADVANTAGE - The mask minimizes amount of bacteria that proliferate in area of daily living (claimed).