• 专利标题:   Method for manufacturing flexible substrate high frequency graphene nano-electromechanical resonator used in e.g. biological medical engineering, involves coating PDMS layer in silicon substrate, and processing imidization reaction process.
  • 专利号:   CN104038173-A, CN104038173-B
  • 发明人:   XU R, YAN B, SUN Y, XU Y, DONG R, WU Y
  • 专利权人:   UNIV CHINA ELECTRONIC SCI TECHNOLOGY
  • 国际专利分类:   H03H003/02
  • 专利详细信息:   CN104038173-A 10 Sep 2014 H03H-003/02 201480 Pages: 8 Chinese
  • 申请详细信息:   CN104038173-A CN10255822 10 Jun 2014
  • 优先权号:   CN10255822

▎ 摘  要

NOVELTY - The method involves coating a PDMS layer in a high resistance silicon substrate. A flexible substrate is coated with a photo-resist layer. A metal evaporation model is obtained to evaporate metal titanium and gold-molybdenum alloy material. A gate metal electrode is connected with the flexible substrate and embedded in a polyimide substrate. A source metal electrode is connected with a drain metal electrode. An imidization reaction process is processed. The flexible substrate and a separate silicon substrate are covered by the PDMS layer. USE - Method for manufacturing flexible substrate high frequency graphene nano-electromechanical resonator (NEMS) used in wearable electronics, biological medical engineering and flexible wireless communication devices. ADVANTAGE - The method enables improving viscosity of PDMS layer and flexible substrate through an oxygen reaction ion etching process, effectively improving smoothness and flatness between the substrates, improving frequency and quality of a NEMS electronic device and preventing the flexible substrate from being damaged. DESCRIPTION OF DRAWING(S) - The drawing shows a perspective view of a flexible substrate in sectional.