▎ 摘　　要

NOVELTY - Preparing defect state single-layer graphene film involves placing the copper foil in the middle portion of the quartz tube of the chemical vapor deposition (CVD) system, introducing the reducing gas hydrogen/argon (H2/Ar) mixed gas at the flow rate of 100-300 sccm, where the ratio of H2/Ar mixed gas is 10-90 wt.%, the pressure of the CVD system is controlled at 5-10 pascal (Pa). The CVD tubular furnace rises from 25-900 degrees C in 1.5 hours, then rises to 1000-900 degrees C in 30 minutes;. The methane gas is introduced at a flow rate of 15 -100 sccm, controlled the methane decomposition and growth time is 1-2 hours, to obtain the single-layer graphene film grown on the copper foil. The copper foil grown with single-layer graphene film is placed on the KW-5 type table-type spin coater, coated a layer of PMMA solution on the surface. The rotating speed of the table-type spin coater is 50 revolution per minute (rpm). USE - Method for preparing defect state single-layer graphene film used as catalyst under the action of ozone. ADVANTAGE - The method enables to prepare defect state single-layer graphene realizes efficient removal of organic pollutant in water environment. DETAILED DESCRIPTION - Preparing defect state single-layer graphene film involves placing the copper foil in the middle portion of the quartz tube of the chemical vapor deposition (CVD) system, introducing the reducing gas hydrogen/argon (H2/Ar) mixed gas at the flow rate of 100-300 sccm, where the ratio of H2/Ar mixed gas is 10-90 wt.%, the pressure of the CVD system is controlled at 5-10 pascal (Pa). The CVD tubular furnace rises from 25-900 degrees C in 1.5 hours, then rises to 1000-900 degrees C in 30 minutes;. The methane gas is introduced at a flow rate of 15 -100 sccm, controlled the methane decomposition and growth time is 1-2 hours, to obtain the single-layer graphene film grown on the copper foil. The copper foil grown with single-layer graphene film is placed on the KW-5 type table-type spin coater, coated a layer of PMMA solution on the surface. The rotating speed of the table-type spin coater is 50 revolution per minute (rpm). The glue evening time is 15-30 seconds. The copper foil coated with PMMA on the surface is soaked into the ferric chloride (FeCl3) solution with the concentration of 1-5 mol/L. The copper foil is etched for 4-10 hour, floated a layer of PMMA graphene film on the surface of the solution. The graphene film of PMMA floating is taken by silicon dioxide/ silicon (SiO2/Si) sheet, and used de-ionized water to wash for 3-5 times. The SiO2/Si sheet loaded with the graphene film loaded with PMMA is placed in the oven, dried for 0.5-2hours under the 60-100 degrees C. The SiO2/Si sheet is soaked into the acetone solution, and etched the PMMA. The SiO2/Si sheet is transferred to the plasma cleaning machine. The graphene thin film is etched. The power of the plasma cleaning machine is set to be 700-900 watt (w), and the etching time is 2-6 seconds to obtain the defect state single-layer graphene film. An INDEPENDENT CLAIM is included for a method for preparing ozone catalytic degradation of nominol, which involves: (A) fixing the SiO2/Si sheet loaded with the defective single-layer graphene film in the aqueous solution rich in nominol; (B) introducing the ozone gas generated by the ozone generator into the aqueous solution; (C) generating a large amount hydroxide (OH) on the surface of the graphene film by the ozone molecule; and (D) oxidizing and degrading the new nominol in the aqueous solution, when the ozone is introduced into the aqueous solution for 60 minutes, the degradation efficiency of the new nominol in the aqueous solution reaches 94.65 wt.%.