▎ 摘　　要

NOVELTY - The apparatus (10C) has a source supplying unit (12) fixed in a chamber (11), where the source supplying unit includes a source material for generation of extreme UV light (L2). A plasma generator (13) generates plasma (P) from the source material. An optical unit (15) is fixed in the chamber. A protection film (16) is arranged adjacent to the optical unit, and includes graphite or graphene. The optical unit includes a condenser (14B) to condense light generated from the plasma. The optical unit includes a filter (14A) to allow the generated extreme UV light to pass through the optical unit. USE - Extreme UV light generation apparatus for generating extreme UV light to realize a testing system. ADVANTAGE - The protection film protects parts or neighboring components from the extreme UV light and transmittance of the extreme UV light from being excessively changed in a protection process. The apparatus increases a replacement period of optical components and reduces a down-time of the apparatus, due to graphene better characteristics such as high hardness, better heat resistance and better pressure resistance, thus improving process efficiency of the apparatus. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for the following: (1) an exposure system (2) a system for a chamber for generating extreme UV light. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of an extreme UV light generation apparatus. Extreme UV light (L2) Plasma (P) Extreme UV light generation apparatus (10C) Chamber (11) Source supplying unit (12) Plasma generator (13) Filter (14A) Condenser (14B) Optical unit (15) Protection film (16)