• 专利标题:   Gallium nitride-based high electron mobility transistor epitaxial wafer, comprises substrate, graphene layer, metal nanometer particle layer, three-dimensional nucleation layer, buffer layer, gallium nitride channel layer and aluminum gallium nitride barrier.
  • 专利号:   CN209561413-U
  • 发明人:   DING T, ZHOU B, HU J, LI P
  • 专利权人:   HC SEMITEK SUZHOU CO LTD
  • 国际专利分类:   H01L029/26, H01L029/778
  • 专利详细信息:   CN209561413-U 29 Oct 2019 H01L-029/26 201986 Pages: 12 Chinese
  • 申请详细信息:   CN209561413-U CN20258319 28 Feb 2019
  • 优先权号:   CN20258319

▎ 摘  要

NOVELTY - The utility model claims a GaN-based high electronic mobility transistor epitaxial wafer, belonging to the high electron mobility transistor field. the high electron mobility transistor epitaxial wafer, comprising: a substrate, a graphene layer sequentially deposited on the substrate, the metal nanometer particle layer, three-dimensional nucleation layer, a buffer layer, a GaN channel layer, an AlGaN barrier layer, and a GaN cap layer; the metal nanometre particle layer comprises a plurality of metal nano-particles located on the graphene layer, and each of the metal nano-particles are in contact with the graphene layer, the diameter of the metal nano-particle is 1 to 20nm, the adjacent gap exists between the metal nanometer particle.