• 专利标题:   Method for manufacturing multi-layered quantum carbon-based semiconductor material, involves adjusting temperature to perform graphitization, and carrying doping with non-metallic material to form quantum dots in multi-layered graphene.
  • 专利号:   WO2018035688-A1
  • 发明人:   LIU P
  • 专利权人:   SHENZHEN DANBOND TECHNOLOGY CO LTD
  • 国际专利分类:   H01L021/324, H01L029/12, H01L029/16, H01L029/167
  • 专利详细信息:   WO2018035688-A1 01 Mar 2018 H01L-029/12 201819 Pages: 11 Chinese
  • 申请详细信息:   WO2018035688-A1 WOCN096271 22 Aug 2016
  • 优先权号:   WOCN096271

▎ 摘  要

NOVELTY - The method involves performing high-molecular weight sintering at first temperature to remove hydrogen, oxygen and nitrogen atoms and form a carbon precursor using a polyimide membrane as the raw material. Second temperature is adjusted to perform graphitization on the carbon precursor to form a multi-layered graphene quantum carbon-based two-dimensional semiconductor material. Doping with a non-metallic material is carried out to form quantum dots in a multi-layered graphene. USE - Method for manufacturing a multi-layered graphene quantum carbon-based semiconductor material. ADVANTAGE - The method enables providing a structure that has an orderly arrangement, is flexible, has a large tortuosity ratio, and extremely small intrafacial dispersion and offset. The method enables achieving large area, low cost, large batch, and continuous reel-to-reel production. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a multi-layered graphene quantum carbon-based semiconductor material.