▎ 摘　　要

NOVELTY - The method involves depositing a first material layer over a substrate, depositing a graphene layer over the first material layer forming a first assembly having the substrate, the first material layer, and the graphene layer, attaching a carrier to the graphene layer, removing the substrate from the first assembly, and removing the first material layer from the first assembly. A pellicle frame is mounted to the first assembly and opposite the carrier after the removing of the first material layer. The carrier is detached from the first assembly resulting in a second assembly. USE - Graphene pellicle method for extreme ultraviolet lithography. ADVANTAGE - Avoids breakages during the pellicle's manufacturing, assembling, and handling processes. DESCRIPTION OF DRAWING(S) - The drawing shows the schematic diagram of a lithography system that may benefit. Lithography system (100) Radiation source (102) Radiation beam (104) Condenser optic (106) Pellicle (107)