▎ 摘　　要

NOVELTY - Process for cleaning graphene involves removing a graphene support layer having a graphene layer formed on one side using an organic solvent, and removing a graphene support layer residue by positioning a cleaning component at a distance allowing for interaction on the graphene layer from which the graphene support layer is removed and moving the cleaning component on the graphene layer. USE - Process for cleaning graphene used in device. ADVANTAGE - The device containing the economically cleaned graphene has excellent electrical property, mechanical property and optical property. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for cleaned graphene-containing device.