• 专利标题:   Graphene ultra-surface microstructure high efficiency adjustable absorber has cross-shaped well that is hollowed out, and top layer that is covered with layer of graphene, and is stacked in turn to form complete absorber.
  • 专利号:   CN110120591-A
  • 发明人:   CHEN M, ZHANG W, LIU H, ZHAO D, WANG C, GAO W, CHEN C, YUAN L
  • 专利权人:   UNIV GUILIN ELECTRONIC TECHNOLOGY
  • 国际专利分类:   H01Q015/00, H01Q017/00, H05K009/00
  • 专利详细信息:   CN110120591-A 13 Aug 2019 H01Q-015/00 201976 Pages: 7 Chinese
  • 申请详细信息:   CN110120591-A CN10188481 13 Mar 2019
  • 优先权号:   CN10188481

▎ 摘  要

NOVELTY - The absorber has metal gold substrate (1), silicon dioxide dielectric layer (2), silicon dielectric layer (3) and graphene layer (4). The metal has a thickness of 100 nm and is used for the substrate. The intermediate silicon dioxide dielectric layer has thickness of 380 nm. The silicon dielectric layer has a thickness of 480 nm. The cross-shaped well has a length of 500 nm, width of100 nm, and depth of 300 nm and is hollowed out. The top layer is covered with a layer of graphene, and is stacked in turn to form a complete absorber. USE - Graphene ultra-surface microstructure high efficiency adjustable absorber. ADVANTAGE - The perfect impedance matching is achieved at the resonant frequency point. The magnetic resonance and electrical resonance achieve synchronization. The absorbing effect is realized through the super-surface structure of graphene. The absorber has strong absorption and tunability. DESCRIPTION OF DRAWING(S) - The drawing shows the schematic view of the graphene ultra-surface microstructure high efficiency adjustable absorber. Metal gold substrate (1) Silicon dioxide dielectric layer (2) Silicon dielectric layer (3) Graphene layer (4)