▎ 摘　　要

NOVELTY - The structure has a glass substrate (1), transparent conductive thin film (3), first transmission layer (4), perovskite absorption layer (5), second transmission layer (6) and metal electrode layer (7) from bottom to top. A groove is formed in one surface of the glass substrate which is in contact with the transparent conductive thin film, and grid lines (2) are deposited in the groove. A depth of the groove is 0.1 to 50 mu m, and a width of the groove is 1 to 50 mu m. Distance between centers of two adjacent grooves is in preset value. A thickness of the transparent conductive thin film is 100 to 2000 nm. A thickness of the first transmission layer is 10-50 nm. USE - Structure of perovskite battery containing grid line. ADVANTAGE - The technical problems of uneven subsequent coating and difficult blade coating caused by the conventional preparation of the surface bulge of the grid line are solved by etching the surface of the glass substrate to form the groove and embedding the metal grid line. The unevenness of the glass substrate caused by the height of the grid lines is avoided by embedding the grid lines into the glass, and the uniform film layer is formed in the subsequent processes of blade coating, magnetic control and evaporation. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a method for preparing perovskite battery structure. DESCRIPTION OF DRAWING(S) - The drawing shows the cross-section view of the structure of perovskite battery containing grid line. Glass substrate (1) Grid line (2) Transparent conductive thin film (3) First transmission layer (4) Perovskite absorption layer (5) Second transmission layer (6) Metal electrode layer (7)