▎ 摘　　要

NOVELTY - Manufacturing a porous graphene layer (112) across a precursor material layer (102) on a substrate (104), comprises: (a) determining a first temperature threshold and a second temperature threshold; (b) determining at least one of operating parameters of a light source, where exposing the precursor material layer to the light source that is operating under the operating parameter causes a temperature of the portion of the substrate adjoining a side of the precursor material layer to maintain below the second temperature threshold and a temperature of the opposite side of the precursor material layer to rise above the first temperature threshold; and (c) generating a beam of light (108) from the light source to the precursor material layer based on the operating parameter of the light source to form the porous graphene layer. USE - The method is useful for manufacturing porous graphene layer which is used in electronic device, and film (all claimed). ADVANTAGE - The method provides porous graphene layer with high performance. DETAILED DESCRIPTION - Manufacturing a porous graphene layer (112) across a precursor material layer (102) on a substrate (104), comprises: (a) determining a first temperature threshold and a second temperature threshold, where the first temperature threshold is a minimum temperature required for forming the porous graphene layer from a precursor material layer on a portion of the substrate, and the second temperature threshold is one at which the substrate is likely to experience thermal damages above this temperature threshold; (b) determining at least one of operating parameters of a light source, where exposing the precursor material layer to the light source that is operating under the operating parameter causes a temperature of the portion of the substrate adjoining a side of the precursor material layer to maintain below the second temperature threshold and a temperature of the opposite side of the precursor material layer to rise above the first temperature threshold; and (c) generating a beam of light (108) from the light source to the precursor material layer based on the operating parameter of the light source to form the porous graphene layer. INDEPENDENT CLAIMS are also included for: (1) apparatus for manufacturing a porous graphene layer across a precursor material layer on substrate, comprising at least one processor, and at least one memory including computer program code, where the memory and the computer program code are configured to the steps (a) and (b) as per with at least one processor; (2) electronic device comprising at least one porous graphene layer across a precursor material layer on substrate; and (3) film comprising substrate and at least one porous graphene layer across a precursor material layer on the substrate. DESCRIPTION OF DRAWING(S) - The figure shows schematic view of process for manufacturing the porous graphene layer across precursor material layer on substrate. Precursor material layer (102) Substrate (104) Beam of light (108) Lens (110) Porous graphene layer (112)