▎ 摘　　要

NOVELTY - Preparing soft elastic superhydrophobic low ice adhesion surface with photothermal effect, comprises e.g. (ia) preparing photothermal elastomer microspheres by: mechanically stirring the liquid silicone rubber, base curing agent, and photothermal particles to obtain a uniform mixed liquid C; fully mixing emulsifier and deionized water to obtain water emulsion D; vacuumizing the mixed liquid C, adding it into water emulsion D, and emulsifying to obtain the mixed emulsion, mechanically stirring and solidifying, using a 600-mesh gauze to filter the photothermal spherical particle aqueous emulsion, cooling the obtained photothermal spherical particle aqueous emulsion, centrifuging to obtain photothermal spherical particles, adding them to dispersant; and (ib) preparing modified silicon dioxide by: dispersing silicon dioxide into ammonia solution, ultrasonically treating, obtaining silica ammonia solution, taking modifier and dispersing it in absolute ethanol, ultrasonically hydrolyzing. USE - The method is useful for preparing soft elastic superhydrophobic low ice adhesion surface with photothermal effect. ADVANTAGE - The method: is simple; cures surface at room temperature; and obtained surface has excellent superhydrophobic performance, anti-icing performance, low ice adhesion performance and photothermal self-deicing performance. DETAILED DESCRIPTION - Preparing soft elastic superhydrophobic low ice adhesion surface with photothermal effect, comprises (ia) preparing photothermal elastomer microspheres by: mechanically stirring the liquid silicone rubber, base curing agent, and photothermal particles at mass ratio of 1-10:1-10:0.01-5 to obtain a uniform mixed liquid C; fully mixing emulsifier and deionized water according to the volume ratio of 1-5:20-100 to obtain the water emulsion D; vacuumizing the mixed liquid C at 0-10°C for 30-60 minutes, adding it into water emulsion D, and emulsifying at a stirring speed of 500-5000 revolutions/minute for 30-150 minutes to obtain the mixed emulsion, mechanically stirring and solidifying at 80°C for 30-200 minutes, using a 600-mesh gauze to filter the photothermal spherical particle aqueous emulsion, cooling the obtained photothermal spherical particle aqueous emulsion at 0-10°C for 1-2 hours, centrifuging at a speed of 1000-5000 revolutions/minute to obtain photothermal spherical particles, adding them to dispersant at a mass ratio of 0.1-1%; (ib) preparing modified silicon dioxide by: dispersing 1 pts. wt. silicon dioxide into ammonia solution, ultrasonically treating for 10 minutes, obtaining silica ammonia solution, taking the modifier and dispersing it in absolute ethanol, ultrasonically hydrolyzing for 30-60 minutes, obtaining modifier ethanol dispersion liquid, adding the ammonium silica solution into modifier ethanol dispersion, and mechanically stirring at 40°C for 6-12 hours to obtain modified silicon dioxide; the ratio of silicon dioxide, aqueous ammonia, deionized water, modifier and absolute ethanol in whole modification process is: 1-10g: 4-20ml: 10-100ml: 1-5ml: 60-200ml; and (ic) preparing photothermal elastomer microsphere dispersion by: ultrasonic mixing photothermal spherical particles obtained above, modified silicon dioxide, and solvent at a mass ratio of 1:0.01-0.5:20-60 for 5 minutes, obtaining spherical particle dispersion liquid with photothermal effect; (iia) mixing the substrate and the curing agent uniformly at a volume ratio of 1:5-20 to obtain a mixed liquid, vacuumizing the mixed liquid at low temperature of 0-10°C for 5-30 minutes, using a scraper to evenly coat the surface, curing at 30-80°C for 5-120 minutes to obtain semi-dry substrate; and (iib) preparing photothermal superhydrophobic anti-icing coating by: using a spray gun to evenly spray the dispersion of spherical particles with photothermal effect on the semi-dry substrate surface in the first step (3), curing at 30-80°C for 12-24 hours, and obtaining photothermal superhydrophobic anti-icing coating.