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  • 专利标题:   Ceramic heater used in semiconductor manufacturing equipment, comprises ceramic substrate comprising aluminum nitride, magnesium oxide/alumina/spinel, calcium oxide and titanium dioxide, and resistance heating element.
  • 专利号:   WO2023090862-A1, KR2535856-B1
  • 发明人:   KIM Y H, KIM J H, PARK H Y, KIM B S, HWAN K J, SUNG K
  • 专利权人:   KSM COMPONENT CO LTD
  • 国际专利分类:   C04B035/58, C04B035/581, H01L021/67, H05B001/02, H05B003/28
  • 专利详细信息:   WO2023090862-A1 25 May 2023 H01L-021/67 202345 Pages: 20
  • 申请详细信息:   WO2023090862-A1 WOKR018121 16 Nov 2022
  • 优先权号:   KR160465, KR126575

▎ 摘　　要

NOVELTY - A ceramic heater comprises a ceramic substrate comprising (a) aluminum nitride, (b) at least one of magnesium oxide, alumina and spinel, (c) calcium oxide and (d) titanium dioxide, and a resistance heating element. USE - Ceramic heater used in semiconductor manufacturing equipment. ADVANTAGE - The ceramic heater has excellent volume resistance at high temperature, and thermal conductivity at room temperature.