▎ 摘　　要

NOVELTY - The method involves depositing at least one graphene layer (2) on a planar surface of a substrate (6), in which the substrate is made up of first substrate portion and a second substrate portion (12), and removing the first substrate portion to form a freestanding membrane (14) from the at least one graphene layer, in which the freestanding membrane is supported by the second substrate portion. The freestanding membrane is at least 80% transparent to radiation having a wavelength of 13.5 nanometers. USE - Method for manufacturing pellicle for lithographic apparatus (all claimed). ADVANTAGE - By using freestanding graphene membranes, consistency and control in methods of manufacturing pellicles, the ability reliably to produce large pellicles and lifetime of pellicles are improved. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for the following: (1) a pellicle for a lithographic apparatus; (2) a device manufacturing method; (3) an apparatus for processing a pellicle; (4) a pellicle assembly suitable for use in a lithographic process; (5) a mask assembly suitable for use in a lithographic process; and (6) a a lithographic apparatus. DESCRIPTION OF DRAWING(S) - The drawing shows the cross-sectional view of the substrate and at least one graphene layer after processing to form a pellicle. Graphene layer (2) Substrate (6) Second substrate portion (12) Freestanding membrane (14) Pellicle (80)