▎ 摘　　要

NOVELTY - Preparation of graphene, involves taking substrate, depositing metal oxide layer on substrate, depositing metal layer (A) over the metal oxide layer and patterning metal layer (A), depositing graphene layer on patterned metal layer (A), aligning graphene layer with interface of graphene layer of device to be transferred, using laser to break link between two layers between substrate and metal layer (A), transferring graphene layer correspondingly to interface, removing all portions of graphene layer on metal layer side (A) and retaining only graphene layer on device. USE - Preparation of graphene. ADVANTAGE - The method enables preparation of graphene with high quality by simple process. DETAILED DESCRIPTION - Preparation of graphene, involves (1) taking substrate, depositing metal oxide layer on substrate, (2) depositing metal layer (A) over the metal oxide layer and patterning metal layer (A), (3) depositing graphene layer on patterned metal layer (A), (4) aligning graphene layer with interface of graphene layer of device to be transferred, using laser to break link between two layers between substrate and metal layer (A), transferring graphene layer correspondingly to interface, (5) removing all portions of graphene layer on metal layer side (A) and retaining only graphene layer on the device.