• 专利标题:   Forming bernal-stacked graphene layers involves depositing metal layer with grain boundary on substrate, performing direct-annealing the metal layer to remove impurities and recrystallise metal layer in form of groove-like structure.
  • 专利号:   WO2020101467-A1
  • 发明人:   MOHAMMAD HANIFF M A, MD YAKIN F S, SYONO M L
  • 专利权人:   MIMOS BERHAD
  • 国际专利分类:   C01B032/186
  • 专利详细信息:   WO2020101467-A1 22 May 2020 C01B-032/186 202045 Pages: 18 English
  • 申请详细信息:   WO2020101467-A1 WOMY000044 11 Nov 2019
  • 优先权号:   MY001924

▎ 摘  要

NOVELTY - Forming bernal-stacked graphene layers involves depositing metal layer with grain boundary on substrate, performing direct-annealing the metal layer to remove impurities and recrystallise the metal layer in the form of groove-like structure, forming the graphene layers in bernal-stacking on the metal layer by catalytic surface reactions with gas and benzene precursors in the ratio of 250 to 3 cm3 min-1 at temperature of 200-700 degrees C. The direct-annealing metal layer is performed at temperature of 200-700 degrees C in inert or reducing atmosphere. USE - Method for forming bernal-stacked graphene layers. ADVANTAGE - The method enables to form bernal-stacked graphene layers that is cost effective.