• 专利标题:   Preparing nanoporous graphene material involves preparing nano-porous nickel foam by pickling foamed nickel substrate, removing surface oxide film, then rinsing with deionized water to neutrality and drying for later use.
  • 专利号:   CN111533113-A
  • 发明人:   XU H
  • 专利权人:   QINGDAO CANYAO NEW MATERIAL TECHNOLOGY
  • 国际专利分类:   B22F009/22, C01B032/186, C23C016/26, C23F001/14, C23F001/28
  • 专利详细信息:   CN111533113-A 14 Aug 2020 C01B-032/186 202075 Pages: 6 Chinese
  • 申请详细信息:   CN111533113-A CN10521141 10 Jun 2020
  • 优先权号:   CN10521141

▎ 摘  要

NOVELTY - Preparing nanoporous graphene material involves preparing nano-porous nickel foam by pickling the foamed nickel substrate, removing the surface oxide film, then rinsing with deionized water to neutrality and drying for later use. The obtained foamed nickel substrate is put into reactor containing urea solution for hydrothermal reaction. The temperature of hydrothermal reaction is 120-140 degrees C, and time is 1-3 hours. The foamed nickel substrate is taken out, washed and dried to obtain a foamed nickel substrate with a nanoporous structure on the surface. The obtained foamed nickel substrate is placed in a reducing atmosphere for surface reduction, after hydrothermal reaction. The nickel oxide, nickel hydroxide, basic nickel carbonate and other nickel oxides are generated on the surface of foam nickel are reduced to nickel element to obtain a nanoporous foam nickel substrate, which is used as a substrate for growing nanoporous graphene. USE - Method for preparing nanoporous graphene material. DETAILED DESCRIPTION - Preparing nanoporous graphene material involves preparing nano-porous nickel foam by pickling the foamed nickel substrate, removing the surface oxide film, then rinsing with deionized water to neutrality and dry for later use. The obtained foamed nickel substrate is put into a reactor containing urea solution for hydrothermal reaction. The temperature of the hydrothermal reaction is 120-140 degrees C, and the time is 1-3 hours. The foamed nickel substrate is taken out, washed and dried to obtain a foamed nickel substrate with a nanoporous structure on the surface. The obtained foamed nickel substrate is placed in a reducing atmosphere for surface reduction, after the hydrothermal reaction. The nickel oxide, nickel hydroxide, basic nickel carbonate and other nickel oxides are generated on the surface of the foam nickel are reduced to nickel element to obtain a nanoporous foam nickel substrate, which is used as a substrate for growing nanoporous graphene. The chemical vapor deposition method is used to deposit graphene on the surface of prepared nanoporous nickel foam substrate to obtain nanoporous graphene. The deposition time is 5-15 minutes. The nanoporous nickel foam substrate is placed with nanoporous graphene grown in the etching solution. The nanoporous foam nickel substrate is etched and removed to obtain individual nanoporous graphene.