▎ 摘　　要

NOVELTY - Manufacturing wrinkled graphene comprises providing a graphene unit, and then inserting a carrier film and the graphene unit between a pair of rolls and rotating the pair of rolls in opposite directions to attach the carrier film to the graphene unit. Graphene is provided by immersing the graphene unit in an etching solution. The graphene and poly (4-styrene sulfonic acid)/polystyrene (PSS/PS) substrate are inserted between the pair of rolls and attached the graphene to the PSS/PS substrate. The carrier film is removed from the graphene, and heated the graphene/PSS/PS stack. The PS substrate is shrunken to generate wrinkled graphene (WGr), and inserted a polymeric substrate. The WGr and the PSS/PS substrate are inserted between the pair of rolls, where the polymeric substrate is attached onto the WGr by rotating the pair of rolls in opposite directions. USE - Method for manufacturing wrinkled graphene on EVA/PET substrate. ADVANTAGE - The method manufactures the wrinkled graphene on EVA/PET substrate in a simple and cost-effective manner with large-area using roll-to-roll processing, excellent mechanical, structural, electrical, optical, chemical stability and transferability. DETAILED DESCRIPTION - Manufacturing wrinkled graphene comprises providing a graphene unit, and then inserting a carrier film and the graphene unit between a pair of rolls and rotating the pair of rolls in opposite directions to attach the carrier film to the graphene unit. Graphene is provided by immersing the graphene unit in an etching solution. The graphene and poly (4-styrene sulfonic acid)/polystyrene (PSS/PS) substrate are inserted between the pair of rolls and attached the graphene to the PSS/PS substrate. The carrier film is removed from the graphene, and heated the graphene/PSS/PS stack. The PS substrate is shrunken to generate wrinkled graphene (WGr), and inserted a polymeric substrate. The WGr and the PSS/PS substrate are inserted between the pair of rolls, where the polymeric substrate is attached onto the WGr by rotating the pair of rolls in opposite directions. The polymeric substrate/WGr/PSS/PS substrate is immersed in water to remove the PS substrate by dissolving the PSS substrate, where a wrinkled graphene substrate is provided on the polymeric substrate. An INDEPENDENT CLAIM is included for a method for manufacturing wrinkled graphene on a polydimethylsiloxane (PDMS) substrate, which involves providing a graphene unit, inserting a carrier film and the graphene unit between a pair of rolls, providing graphene by immersing the graphene unit in an etching solution, inserting the graphene and poly (4-styrene sulfonic acid)/polystyrene (PSS/PS) substrate, removing the carrier film from the graphene, heating the graphene/PSS/PS stack, coating the PDMS on the wrinkled graphene to attach the PDMS substrate, immersing the PDMS/WGr/PSS/PS stack in water to remove the PS substrate by dissolving PSS interface layer, and providing a wrinkled graphene substrate on which the wrinkled graphene is transferred onto the PDMS.