• 专利标题:   Pellicle film used in extreme UV lithography, comprises carbyne layer containing structure in which carbyne molecules are entangled by applying coating solution prepared by mixing carbyne molecules and solvent and drying.
  • 专利号:   KR2349295-B1, WO2022169170-A2, WO2022169170-A3
  • 发明人:   CHOI J H, CHO S J, YU L, KIMCHUNG, SEO K, KIM K S, LEE S Y, MOON S Y, KIM C, SEO K W
  • 专利权人:   FINE SEMITECH CORP
  • 国际专利分类:   G03F001/62, C01B032/168, C01B032/194, G03F001/22
  • 专利详细信息:   KR2349295-B1 10 Jan 2022 G03F-001/62 202209 Pages: 11
  • 申请详细信息:   KR2349295-B1 KR014584 02 Feb 2021
  • 优先权号:   KR014584

▎ 摘  要

NOVELTY - A pellicle film comprises a carbyne layer containing a structure in which carbyne molecules are entangled by applying a coating solution prepared by mixing carbyne molecules and a solvent and drying. USE - Pellicle film used in extreme UV lithography during manufacture of semiconductor device and liquid crystal display panel. ADVANTAGE - The pellicle film has high thermal stability, and high strength. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for manufacture of the pellicle film, which involves preparing the coating solution by mixing carbyne molecules and the solvent, applying the coating solution on a substrate, and drying the applied coating solution to form a carbyne layer containing the structure.