▎ 摘　　要

NOVELTY - The method comprises injecting radicals of a gas onto a surface of carbon material to generate carbon radicals, exposing (916) a part of a surface of a substrate to the generated carbon radicals to deposit a layer of graphene or conjugated carbons, moving (920) the substrate to expose different parts of the surface of the substrate to the generated carbon radicals, discharging excess carbon radicals remaining after exposing to the part of the surface of the substrate, and injecting (904) gas into a plasma chamber defined by a first electrode and a second electrode. USE - The method is useful for depositing a layer of graphene or conjugated carbons on a surface of a substrate (claimed) using a radical reactor in the manufacture of an electronic device such as organic light emitting diode device. ADVANTAGE - The method enables efficient and economic deposition of the layer of very thin, strong, transparent and flexible graphene or conjugated carbons on the surface of the substrate with high uniformity at high speed. DETAILED DESCRIPTION - The method comprises injecting radicals of a gas onto a surface of carbon material to generate carbon radicals, exposing (916) a part of a surface of a substrate to the generated carbon radicals to deposit a layer of graphene or conjugated carbons, moving (920) the substrate to expose different parts of the surface of the substrate to the generated carbon radicals, discharging excess carbon radicals remaining after exposing to the part of the surface of the substrate, injecting (904) gas into a plasma chamber defined by a first electrode and a second electrode, applying (908) voltage difference across the first electrode and the second electrode to generate the radicals of the gas, and depositing a dielectric layer on the surface by atomic layer deposition or molecular layer deposition. A temperature of the substrate is controlled to 100-500 degrees C. The layer of graphene or conjugated carbons is deposited on the dielectric layer. An INDEPENDENT CLAIM is included for an apparatus for depositing a layer of graphene or conjugated carbons. DESCRIPTION OF DRAWING(S) - The diagram shows a flowchart of a process for depositing a layer of graphene or conjugated carbons on a surface of a substrate. Inject gas into plasma chamber (904) Apply voltage signal to electrodes to generate plasma (908) Inject radicals generated in plasma chamber onto carbon material to generate carbon radicals (912) Expose part of substrate to carbon radicals (916) Move substrate to expose different part of substrate to carbon radicals. (920)