▎ 摘　　要

NOVELTY - Depositing nanoscale-thin film in preselected area on substrate involves depositing layer of functionalizing molecule onto or adjacent to first surface of substrate; functionalizing first surface of substrate by focusing source of ionizing radiation onto layer of functionalizing molecule to create desired pattern of functionality with nano-scale spatial resolution on substrate; removing layer of functionalizing molecule; and depositing nanoscale-thin film onto functionalized first surface of substrate to form deposited nanoscale-thin film. USE - Method for depositing nanoscale-thin film in preselected area on substrate used for area-selective atomic layer deposition (AS-ALD) based on electron beam patterning of chemical functional groups. ADVANTAGE - The method enables to provide flexible control of growth area, high spatial resolution, higher contrast between growth and non-growth regions, and have improved mechanical, optical and electrical properties.