▎ 摘　　要

NOVELTY - Preparation of patterned graphene film comprises forming graphene oxide solution wetting area of predetermined pattern on substrate; forming another area other than the wetting area on the substrate, where another area is non-soakage area; coating graphene oxide solution on the wetting area of the substrate to form graphene oxide film; and performing reduction treatment of graphene oxide film to obtain graphene thin film of predetermined pattern. USE - Preparation of patterned graphene film i.e. graphene thin film (claimed). ADVANTAGE - The method is simple and has reduced preparation cost. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for graphene film i.e. graphene thin film having predetermined pattern.