• 专利标题:   Removing impurities in graphene preparation process comprises e.g. washing vermicular graphene aggregate, removing metal ion, adding metal ion complexing agent in liquid phase expansion treatment and ultrasonic wave peeling.
  • 专利号:   CN104787759-A, CN104787759-B
  • 发明人:   DU X, HUANG Q, LI D, LIAO G, MOU S, WANG L
  • 专利权人:   DEYANG CARBONERE TECHNOLOGY CO LTD, DEYANG CARBONERE TECHNOLOGY CO LTD
  • 国际专利分类:   C01B031/04, C01B032/19
  • 专利详细信息:   CN104787759-A 22 Jul 2015 C01B-031/04 201571 Pages: 8 Chinese
  • 申请详细信息:   CN104787759-A CN10186398 20 Apr 2015
  • 优先权号:   CN10186398

▎ 摘  要

NOVELTY - Removing impurities in graphene preparation process comprises using acid washing process, liquid phase expansion treatment step and ultrasonic wave peeling off step, washing vermicular aggregates of graphene, removing metal ion in vermicular graphite layer, adding metal ion complexing agent in liquid phase expansion treatment and ultrasonic wave peeling off process, forming vermicular graphite layers free of metal ion. USE - The method is useful for removing impurities in graphene preparation process (claimed). ADVANTAGE - The method can remove metal ion impurities to provide high purity graphene.