▎ 摘　　要

NOVELTY - The method involves performing ozone or UV treatment to adhere a graphene thin film on a base. The graphene thin film is adhered on a substrate by utilizing non-metallic inorganic acid i.e. nitric acid. Temperature range of an inner chamber of an ozone generator is 25-100 degree Celsius. The ozone or UV treatment is performed for 0.1-10 min. Wave length of UV light is 100-300 nm. Power of the UV light is 1-300 w. The graphene thin film is adhered on a nitric acid liquid surface. USE - Graphene thin film processing method. ADVANTAGE - The method enables improving resistance of the graphene thin film so as to maintain long-term stability at high temperature. The method enables performing a graphene film subsequent patterning process in a convenient manner. The method enables improving light transmittance property and application range of the graphene thin film.