• 专利标题:   Preparing graphene two-dimensional grid structure comprises e.g.adding graphene and dispersant into solvent, uniformly dispersing to obtain stable graphene suspension, adding polydimethylsiloxane curing agent into graphene dispersion liquid.
  • 专利号:   CN112848271-A, CN112848271-B
  • 发明人:   YANG J, DONG S, YOU X, DING Y, GAO L
  • 专利权人:   SHANGHAI INST CERAMICS CHINESE ACAD SCI
  • 国际专利分类:   B29C064/112, B33Y010/00, B33Y080/00
  • 专利详细信息:   CN112848271-A 28 May 2021 B29C-064/112 202152 Pages: 13 Chinese
  • 申请详细信息:   CN112848271-A CN11590171 29 Dec 2020
  • 优先权号:   CN11590171

▎ 摘  要

NOVELTY - Preparing graphene two-dimensional grid structure comprises adding graphene and dispersant into the solvent, uniformly dispersing to obtain stable graphene suspension, adding dimethyl silicone polymer PDMS main agent into the graphene suspension liquid, evaporating part of solvent to obtain graphene dispersion liquid, adding PDMS curing agent into the graphene dispersion liquid to obtain the graphene printing slurry, using the 3 D printer to accumulate graphene printing slurry on the substrate to prepare the two-dimensional grid structure, and solidifying to obtain the graphene two-dimensional grid structure. USE - Method for preparing graphene two-dimensional grid structure used as wearable strain sensor. ADVANTAGE - The method enables to prepare graphene two-dimensional grid structure which is wear resistant. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a graphene two-dimensional grid structure