• 专利标题:   Method for preparing thin film of LED e.g. quantum dot LED (QLED), involves subjecting dry film to standing treatment, heat treatment or ultraviolet light irradiation treatment under inert atmosphere to obtain thin film.
  • 专利号:   CN114203940-A
  • 发明人:   ZHANG J, HONG J, LAI X, YANG F, YAN Y, AO Z
  • 专利权人:   TCL TECHNOLOGY GROUP CORP
  • 国际专利分类:   H01L051/50, H01L051/56
  • 专利详细信息:   CN114203940-A 18 Mar 2022 H01L-051/56 202245 Chinese
  • 申请详细信息:   CN114203940-A CN10977460 17 Sep 2020
  • 优先权号:   CN10977460

▎ 摘  要

NOVELTY - The method involves providing a dry film and an inert atmosphere, and doping the inert atmosphere with an aromatic compound for dissolving the dry film. The dry film is subjected to standing treatment, heat treatment or ultraviolet light irradiation treatment under the inert atmosphere to obtain a thin film. The volume concentration of the aromatic compound in the inert atmosphere is 2.2%-5%, in the step of standing the dry film in the inert atmosphere. The aromatic compound is selected from one of chlorobenzene, bromobenzene and iodobenzene. USE - Method for preparing thin film of LED (claimed) such as quantum dot LED (QLED) and organic LED (OLED). ADVANTAGE - The film morphology of the hole functional layer is improved, the interface resistance between the hole functional layer and the light-emitting layer is reduced, the hole transport efficiency of the device is improved, and the hole transport efficiency and the electron transport efficiency of the device are effectively balanced, thus improving the optoelectronic performance and working life of the device. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following: (1) a method for preparing LED; and (2) a LED. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic structural diagram of a light emitting diode. Anode (1) Light-emitting layer (3) Cathode (5) Hole injection layer (21) Hole transport layer (22)