• 专利标题:   Low thermal resistance and anti-irradiation nano- multilayer thin film material has multilayer composite structure in which metal tungsten nano-meter film and single layer graphene are cross-laminated.
  • 专利号:   CN106350771-A, CN106350771-B
  • 发明人:   XIAO X, SI S, ZHAO X, LI W, JIANG C
  • 专利权人:   UNIV WUHAN, UNIV WUHAN
  • 国际专利分类:   C23C014/18, C23C014/35, C23C016/01, C23C016/26, C23C028/00
  • 专利详细信息:   CN106350771-A 25 Jan 2017 C23C-014/18 201716 Pages: 11 Chinese
  • 申请详细信息:   CN106350771-A CN10908041 18 Oct 2016
  • 优先权号:   CN10908041

▎ 摘  要

NOVELTY - The material has multilayer composite structure in which the metal tungsten nano-meter film and the single layer graphene are cross-laminated. The metallic tungsten nano-meter film is a polycrystalline metal tungsten nano-meter film. The monolayer graphene is a two-dimensional material of a single atomic layer. USE - Low thermal resistance and anti-irradiation nano- multilayer thin film material. ADVANTAGE - The low thermal resistance and anti-irradiation nano- multilayer thin film material has excellent anti-radiation ability. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a low thermal resistance and anti-irradiation nano-multilayer thin film material preparation method. DESCRIPTION OF DRAWING(S) - The drawing shows a photographic image of the low thermal resistance and anti-irradiation nano- multilayer thin film material.