▎ 摘　　要

NOVELTY - The apparatus has a main chamber (1), a sub-chamber (2), a heating device (3), a temperature measuring device, an air supply device, a suction device, (4), a flap valve (5) and a boron nitride evaporation source (6). The main chamber is used for the preparation of the film material, and the subchamber is used for the scouring of the boron source. USE - Chemical vapor deposition apparatus for preparing thin film materials such as graphene and hexagonal boron nitride. ADVANTAGE - The rapid cooling is achieved that effectively reduces the cooling process of carbon atoms in the precipitation. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a method for the preparation of graphene. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic structural view of a chemical vapor deposition apparatus. Main chamber (1) Sub-chamber (2) Heating device (3) Suction device (4) Flap valve (5) Boron nitride evaporation source (6)