▎ 摘　　要

NOVELTY - The patterning method involves placing a graphene sheet on a wafer (105), and depositing a metal layer on the graphene sheet (115). The photoresist layer is deposited on the metal layer, and a pattern is etched on the photoresist layer to expose the metal layer. The metal layer is comprised of gold, ruthenium, rhodium, palladium, silver, osmium, iridium, or platinum (110). The deposition of metal layer is comprised of applying a radiation source to the photoresist layer, and the portion of metal layer is removed by washing the portion of metal layer with a potassium iodide solution. USE - Patterning method for graphene. ADVANTAGE - Protects the graphene from contamination or harm during the packaging and assembly of the graphene based device since the temporary protective layer includes a thin layer. DESCRIPTION OF DRAWING(S) - The drawing shows a cross sectional view of the graphene sheet transferred onto a substrate. Wafer (105) Platinum (110) Graphene sheet (115)