▎ 摘　　要

NOVELTY - Removing poly(methyl methacrylate) (PMMA) on graphene surface involves carrying out metal surface etching on the copper-based monolayer graphene that is coated with PMMA, and obtaining PMMA/graphene film. The PMMA/graphene film is cleaned with deionized water, and transferred to silicon/silicon oxide (Si/SiO2) substrate. The Si/SiO2substrate of load PMMA/graphene thin film is placed and clamped on the vibrating metal beam that vibrating assembly is installed, and put out after magnetic stirring for a certain period of time. The vibrating metal beam vertically inserted into the soaking liquid, opened the vibrating component, lifted out after a certain period of time, and closed the vibrating component. The Si/SiO2substrate of the loaded PMMA/graphene film is rinsed, then rinsed the Si/SiO2substrate of the loaded graphene film, blow-dried, and obtained the Si/SiO2of the loaded graphene film of PMMA removed substrate. USE - Method for removing poly(methyl methacrylate) on graphene surface. ADVANTAGE - The method is simple to operate, and can efficiently and quickly remove PMMA on the surface of graphene.