▎ 摘　　要

NOVELTY - Chemical vapor deposition device comprises reaction unit for generating thin film on the substrate by chemical vapor deposition reaction. A bearing panel 50 for bearing the substrate, and capable of carrying the substrate in and out of the reaction unit. The reaction unit comprises one or more reaction chambers 201, and the reaction chamber is provided with a heat preservation cavity. The heat-preserving cavity 21 is a cylindrical body with openings at two ends. USE - Chemical vapor deposition device for realizing continuous growth of graphene film on surface of graphene glass used in high-end consumer goods field, providing solid material basis. ADVANTAGE - The chemical vapour deposition device can realize continuous production of graphene glass. The heat preservation cavity of the reaction chamber is a cylindrical body with openings at two ends, so that the temperature of the chemical vapor deposition device is maintained at a desired temperature for a long period of time. The device allows the reaction chambers to be provided with the heat preservation cavities, so as to prevent the heat from being transferred to the substrate, thus preventing the substrate from being damaged by the heat. The bearing panel is used for bearing the substrate and can strip the substrate in and out of reaction unit, thus allowing the substrate to be easily removed from the reaction unit without damaging the bearing panel, and hence reducing the manufacturing cost of the device. DESCRIPTION OF DRAWING(S) - Second opening heat preservation cavity (21) Heat preservation material (21a) Heat insulation screen (22) Heating component (23) Heat homogenizing plate (24) Positioning frame (25) Temperature measuring component (26) Parallel guide rail (41) Bearing panel (50) Reaction chamber (201)