▎ 摘　　要

NOVELTY - Preparation of moire-type graphene involves (S101) preparing the substrate (S1), in which the graphene (G1) is formed and substrate (S2), in which the graphene (G2) is formed, (S102) arranging the graphene (G1) and graphene (G2) parallel to each other with the graphene (G2) facing the graphene (G1) and in a plane parallel to the plane of the graphene (G1) by observation by reflection high speed electron beam diffraction, (S103) rotating at least one of the substrate (S1) and substrate (S2), in which the crystal orientation of the graphene (G1) matches the crystal orientation of the graphene (G2), rotating at least one of the substrate (S1) and substrate (S2) in a plane parallel to the plane of the graphene (G1), making inconsistent crystal orientation of the graphene (G1) and crystal orientation of the graphene (G2) in a plane parallel to the plane of the first graphene, and (S104) transferring the graphene (G1) to graphene (G2). USE - Preparation of moire-type graphene (claimed). ADVANTAGE - The method easily produces moire-type graphene, in which two graphenes having crystal orientations are rotating at the desired rotation angle overlap each other. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for moire-type graphene, which comprises graphene (G1), and graphene (G2) formed in contact with the graphene (G1). The crystal orientation of the graphene (G1) and crystal orientation of the graphene (G2) in a plane parallel to the plane of the graphene (G1) are different. DESCRIPTION OF DRAWING(S) - The drawing shows a flowchart of the preparation method of moire-type graphene. (Drawing includes non-English language text) Preparation of substrate (S101) Arranging process (S102) Rotating process (S103) Transferring process (S104)