▎ 摘　　要

NOVELTY - Chemical vapor deposition film-forming method of graphene electromagnetic coil comprises selecting nickel, copper, silicon dioxide and/or polyethylene terephthalate, selecting hydrophobic/hydrophilic coating with opposite property, screen-printing pattern opposite to coil pattern on surface of substrate-insulation space of coil, entering substrate into chemical vapor deposition reaction chamber, chemical vapor depositing to obtain graphene film, controlling reaction time, removing coating, forming complete graphene coil, and setting copper or silver metal on terminals of graphene coil. USE - Method for chemical vapor deposition film-forming of graphene electromagnetic coil. ADVANTAGE - The method satisfies process design requirements. DETAILED DESCRIPTION - Chemical vapor deposition film-forming method of graphene electromagnetic coil comprises selecting nickel, copper, silicon dioxide and/or polyethylene terephthalate as substrate material depending on hydrophilicity/hydrophobicity of graphene used, selecting hydrophobic/hydrophilic coating with opposite property, screen-printing pattern opposite to coil pattern on surface of substrate-insulation space of coil, entering substrate into chemical vapor deposition reaction chamber, chemical vapor depositing to obtain graphene film, controlling reaction time, removing coating, forming complete graphene coil, and setting copper or silver metal with good thermal conductivity on two terminals of graphene coil.